Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF₆ Isotropic Etching

verfasst von

Parashara Panduranga, Aly Abdou, Jens Richter, Evan L H Thomas, Soumen Mandal, Zhong Ren, Rasmus H Pedersen, Oliver A Williams, Jeremy Witzens, Maziar P Nezhad

Abstract

A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S

_F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF

₂ isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/-0.47 dB/mm.

Externe Organisation(en)

Cardiff University

Typ

Aufsatz in Konferenzband

Publikationsdatum

12.2019

Publikationsstatus

Veröffentlicht

Peer-reviewed

Ja

ASJC Scopus Sachgebiete

Elektronische, optische und magnetische Materialien, Atom- und Molekularphysik sowie Optik, Elektrotechnik und Elektronik, Computernetzwerke und -kommunikation

Elektronische Version(en)

https://doi.org/10.1109/BICOP48819.2019.9059586 (Zugang: Offen)